Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials

In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we address the theory necessary to understand the operation of the equipment, we do this for each part of the measurement equipment such as: light source, fiber optics splitter, spectrometer, and sample. Later we present a design proposal for a device with the same characteristics and that uses the same characterization technique. The choice of components for our proposal is taken taking into account different technical and cost parameters. It is expected that in the future this design proposal can be used to build and implement this equipment in the laboratories of Yachay Tech University. This tool will provide students and teachers with the capacity to characterize silicon oxide thin film depositions for their learning or research activities. In this way, a positive impact will be created for Yachay Tech University

• 第一著者: Tinoco Mosquera, Fabián Patricio (author)
• フォーマット: bachelorThesis
• 言語: eng
• 出版事項: 2020
• 主題: Espesor; Reflectancia espectral; Interferencia; Equipamiento; Fibra óptica; Thickness; Spectral reflectance; Interference; Equipment; Fiber optic
• オンライン･アクセス: http://repositorio.yachaytech.edu.ec/handle/123456789/288