Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials

In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we addr...

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Библиографические подробности
Главный автор: Tinoco Mosquera, Fabián Patricio (author)
Формат: bachelorThesis
Язык:eng
Опубликовано: 2020
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Online-ссылка:http://repositorio.yachaytech.edu.ec/handle/123456789/288
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