Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials
In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we addr...
Sparad:
| Huvudupphovsman: | |
|---|---|
| Materialtyp: | bachelorThesis |
| Språk: | eng |
| Publicerad: |
2020
|
| Ämnen: | |
| Länkar: | http://repositorio.yachaytech.edu.ec/handle/123456789/288 |
| Taggar: |
Lägg till en tagg
Inga taggar, Lägg till första taggen!
|
Lägg till en tagg Lägg till första kommentaren!