Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials

In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we addr...

• 第一著者: Tinoco Mosquera, Fabián Patricio (author)
• フォーマット: bachelorThesis
• 言語: eng
• 出版事項: 2020
• 主題: Espesor; Reflectancia espectral; Interferencia; Equipamiento; Fibra óptica; Thickness; Spectral reflectance; Interference; Equipment; Fiber optic
• オンライン･アクセス: http://repositorio.yachaytech.edu.ec/handle/123456789/288