Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials
In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we addr...
Wedi'i Gadw mewn:
| Prif Awdur: | |
|---|---|
| Fformat: | bachelorThesis |
| Iaith: | eng |
| Cyhoeddwyd: |
2020
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| Pynciau: | |
| Mynediad Ar-lein: | http://repositorio.yachaytech.edu.ec/handle/123456789/288 |
| Tagiau: |
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