Study of the technique of measuring silica oxide films with the optical reflection method, for its possible implementation using low-cost materials
In the following work we are going to describe the operation of an equipment capable of measuring the film thickness of a silicon oxide sample placed on a silicon substrate, this equipment uses an optical characterization technique called spectral reflectance. In order to achieve that, first we addr...
Gorde:
| Egile nagusia: | |
|---|---|
| Formatua: | bachelorThesis |
| Hizkuntza: | eng |
| Argitaratua: |
2020
|
| Gaiak: | |
| Sarrera elektronikoa: | http://repositorio.yachaytech.edu.ec/handle/123456789/288 |
| Etiketak: |
Etiketa erantsi
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
|
Etiketa erantsi Izan zaitez lehena ohar bat uzten!